China High quality Aluminum Chromium Sputtering Target Quotes, Factory, Manufacturers

Aluminum Chromium Sputtering Target

Brand :Xinkang

Product origin :Hunan,China

Delivery time :1-3 weeks

Supply capacity :1-2 tons / month

Aluminum Chromium Sputtering Targets are produced by HIP technology, usually applied for tool coating. Manufactured by HIP technology, AlCr targets and arc cathodes have more uniform micro-inner structure, and smaller grain size, and suitable for various magnetron sputtering machine and ionic plating machine. End user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process. The tools coated by AlCrN thin films, have higher feed speeds, better cutting performance and higher metal removal rates can be achieved without difficulty.

 

Features

Chemical Composition (at%): AlCr 70/30, AlCr 80/20 , AlCr 65/35, AlCr 50/50

Segregation of weight: +/-0.2wt%

Available Purity: 2N5, 3N

Production Technology: HIP

Shapes: planar targets, rotary target

Average Grain Size: < 100um

 

Avalable thin film materials for tool coating 

Target /cathode

Materials

Materials of Coating

Hardness Hv

Reaction atmosphere

Ti

TiN

2000

N2

Ti

TiCN

2480~2800

CH4+N2

Zr

ZrN

3000

N2

Zr

ZrCN

3200~3400

CH4+N2

TiAI

TiAIN

2400~2900

N2

AlCr

AlCrN

2400~3000

N2

Cr

CrN

1500

N2

Cr

CrCN

1500~2000

CH4+N2

Hf

HfN

2750

N2


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