China High quality Cobalt Chromium Sputtering Target Quotes, Factory, Manufacturers

Cobalt Chromium Sputtering Target

Brand :Xinkang

Product origin :Hunan,China

Delivery time :1-3 weeks

Supply capacity :1-2 tons / month

Cobalt Chromium Sputtering Target are produced by melting technology, it can be used for  depositing high temperature and corrosion resistant film. 

With up to 3N5 purity, uniform grain size, lower oxygen content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process. 

 

Cobalt Chromium Sputtering Target Features

Chemical Composition: CoCr (1-20)wt%

Segregation of weight: +/-0.5wt%

Available Purity: 3N5

Production Technology: melting

Shapes: planar targets


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