China High quality Cobalt Iron Sputtering Target Quotes, Factory, Manufacturers

Cobalt Iron Sputtering Target

Brand :Xinkang

Product origin :Hunan,China

Delivery time :1-3 weeks

Supply capacity :1-2 tons / month

Cobalt Iron Sputtering Target are produced by melting technology, it can be used for depositing Cobalt Iron oxide thin films, which are the first choice for perpendicular magnetic recording thin film materials. 

We can customize CoFe alloy according to customer's requirement, no matter for the composition, size or grain size.

 

Cobalt Iron Sputtering Target Features

Chemical Composition: CoFe90/10, CoFe50/50, CoFe 25/75, CoFeB 40/20/20, other compositions can be customized

Segregation of weight: +/-0.5wt%

Available Purity: 3N5

Production Technology: melting

Shapes: planar targets


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