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Germanium Sputtering Target

Brand :Xinkang

Product origin :Hunan,China

Delivery time :1-3 weeks

Supply capacity :1-2 tons / month

Germanium sputtering targets are made of 5N germanium crystals, due to its wide transmission range in the infrared and opaqueness in the visible light regions, germanium sputtering targets are used for depositing germanium thin film on the optic of thermal imaging camera. Such optics are usually working in the 8 to 14 micron range for passive thermal imaging and for hot-spot detection in military, mobile night vision, and fire fighting applications. It’s also used in infrared spectroscopes and other optical equipment that require extremely sensitive infrared detectors.

But as germanium thin film has a very high refractive index (4.0), so it must be coated with a anti-reflection film.

 

Features

Chemical Composition: pure Ge

Available Purity: 5N, 6N

Crystal structure: Mono-crystalline, poly-crystalline

Conduction Type: N type

Resistivity: 0.03-50Ω.cm

Refractive index (10um): 4.0026

Absorption coefficient (/cm): ≤ 0.03

Optical transmittance: 46%

Surface finish: Ra 1.6um

Round target size: Diameter ≤ 450mm, thickness ≥ 0.5mm

Rectangle target size: 205 x 205mm max 

 

Certificate of analysis of 5N Germanium sputtering target

Germanium Sputtering Target COA.jpg

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