Zirconium Sputtering Target

Zirconium Sputtering Target is produced by EB melting technology, normally used for decorative coating and optical coating. Zirconium Sputtering Targets and zirconium arc cathodes with lower purity are used for making gold color films. With up to 99.2% purity, uniform grain size, lower impurity content, end user can obtain good hardness, high brightness, corrosion and oxidation resistant color without discolour or tarnish for a very long time. We have been supplying Zirconium Sputtering Target or Zirconium arc cathodes for manufacturers of watch, sanitary ware, car mirrors, etc, which are suitable for various magnetron sputtering machines and ion plating machines. 

High pure Zirconium Sputtering Targets contain very low Hafnium is normally applied for optical field.

Features

Chemical Composition: pure Zr

Available Purity: 2N2 (702), 3N5

Production Technology: EB melting

Shapes: planar targets

Average Grain Size: < 100um  

Certificate of analysis of 3N5 pure Zirconium sputtering target

Available targets / arc cathodes for decorative application